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Thermal Oxidation Solutions

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Choose products to compare anywhere you see 'Add to Compare' or 'Compare' options displayed. Compare All Close Shopping cart items Shopping cart items Keyword search Search Submit search mks Search Submit search Products MKS Capacitance Manometers Compact Pressure Transducers General Purpose Pressure Transducers High Performance Pressure Transducers Industrial Pressure Transducers Reference Pressure Transducers View All Capacitance Manometers Mass Flow Controllers & Meters Mass Flow Controllers Mass Flow Meters In Situ Flow Verifiers Flow Ratio Controllers Mass Flow Controller Accessories Vacuum Gauges Vacuum Pressure Transducers Vacuum Pressure Sensors Vacuum Gauge Controllers Vacuum Gauge Accessories Vacuum Gauge Calibration Legacy Vacuum Gauges Gas Analyzers Mass Spectrometers Tunable Filter Spectrometers FTIR Gas Analyzers NDIR Gas Analyzers Vacuum Flanges & Fittings ISO-KF Flanges & Fittings ISO-MF Flanges & Fittings CF Flanges & Fittings Butt Weld Flanges & Fittings Custom Vacuum Fabrication RF & Microwave Generators Microwave Generators RF Power Generators Pressure Controllers & Valves Pressure Controllers Vacuum Isolation Valves Downstream Exhaust Throttle Valves Upstream Flow Control Valves Gate Valves Plasma & Reactive Gas Solutions Remote Plasma Sources Ozone Generators & Systems Dissolved Gas Foreline Plasma Clean Systems Automation, Control & Sensing Heater Jackets & Traps Special Offers Virtual Booth Newport Ophir Spectra-Physics Atotech ESI Solutions Semiconductor Electronics and Packaging Specialty Industrial Support Global Service Technical Support Technical Resources Contact MKS Company About MKS Investor Relations News & Media Careers Contact Contact Us Online Corporate Offices Sales & Application Support Calibration, Service & Repairs Product Technical Support Products Semiconductor Thermal Oxidation Thermal Oxidation Thermal oxides are used primarily for gate oxides in silicon semiconductor devices. In this application, it is critical that the silicon dioxide/silicon interface be as perfect as possible with a minimum of atomic scale defects such as "dangling" chemical bonds and non-stoichiometric hydroxyl contaminants.

Thermal Oxidation

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