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VISION-2000-C CVD or Etch Process Monitor

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VISION-2000-C CVD or Etch Process Monitor MKS logo Products MKS Newport Ophir Spectra-Physics Atotech ESI Capacitance Manometers Compact Pressure Transducers General Purpose Pressure Transducers High Performance Pressure Transducers Industrial Pressure Transducers Reference Pressure Transducers View All Capacitance Manometers Mass Flow Controllers & Meters Mass Flow Controllers Mass Flow Meters In Situ Flow Verifiers Flow Ratio Controllers Mass Flow Controller Accessories Vacuum Gauges Vacuum Pressure Transducers Vacuum Pressure Sensors Vacuum Gauge Controllers Vacuum Gauge Accessories Vacuum Gauge Calibration Legacy Vacuum Gauges Gas Analyzers Mass Spectrometers Tunable Filter Spectrometers FTIR Gas Analyzers NDIR Gas Analyzers Vacuum Flanges & Fittings ISO-KF Flanges & Fittings ISO-MF Flanges & Fittings CF Flanges & Fittings Butt Weld Flanges & Fittings Custom Vacuum Fabrication RF & Microwave Generators Microwave Generators RF Power Generators Pressure Controllers & Valves Pressure Controllers Vacuum Isolation Valves Downstream Exhaust Throttle Valves Upstream Flow Control Valves Gate Valves Plasma & Reactive Gas Solutions Remote Plasma Sources Ozone Generators & Systems Dissolved Gas Foreline Plasma Clean Systems Automation, Control & Sensing Heater Jackets & Traps Special Offers Virtual Booth Solutions Semiconductor Electronics and Packaging Specialty Industrial Support Global Service MKS Service Solutions RMA Request Form Health & Safety Forms Contact Global Service Technical Support Product Technical Support Training Programs Contact Product Technical Support Technical Resources Literature Manuals Technical Papers Application Notes Standards Compliance View All Technical Resources Contact MKS Company About MKS Guiding Principles Executives & Fellows Solutions & Innovations Legal Information Environmental, Social and Governance Investor Relations Corporate Governance Stock Information News Releases Events & Presentations Annual Meeting Materials SEC Filings and Forms Financial Analysts All Investor Relations News & Media Trade Shows & Events Press Releases Media Library Careers Job Openings We're Hiring! About MKS MKS Benefits Message from CEO Business Units & Products MY INNOVATION Stories Contact Contact Us Online Corporate Offices Sales & Application Support Calibration, Service & Repairs Product Technical Support Sign In Compare products Product Comparison 

Choose products to compare anywhere you see 'Add to Compare' or 'Compare' options displayed. Compare All Close Shopping cart items Shopping cart items Keyword search Search Submit search mks Search Submit search Products MKS Capacitance Manometers Compact Pressure Transducers General Purpose Pressure Transducers High Performance Pressure Transducers Industrial Pressure Transducers Reference Pressure Transducers View All Capacitance Manometers Mass Flow Controllers & Meters Mass Flow Controllers Mass Flow Meters In Situ Flow Verifiers Flow Ratio Controllers Mass Flow Controller Accessories Vacuum Gauges Vacuum Pressure Transducers Vacuum Pressure Sensors Vacuum Gauge Controllers Vacuum Gauge Accessories Vacuum Gauge Calibration Legacy Vacuum Gauges Gas Analyzers Mass Spectrometers Tunable Filter Spectrometers FTIR Gas Analyzers NDIR Gas Analyzers Vacuum Flanges & Fittings ISO-KF Flanges & Fittings ISO-MF Flanges & Fittings CF Flanges & Fittings Butt Weld Flanges & Fittings Custom Vacuum Fabrication RF & Microwave Generators Microwave Generators RF Power Generators Pressure Controllers & Valves Pressure Controllers Vacuum Isolation Valves Downstream Exhaust Throttle Valves Upstream Flow Control Valves Gate Valves Plasma & Reactive Gas Solutions Remote Plasma Sources Ozone Generators & Systems Dissolved Gas Foreline Plasma Clean Systems Automation, Control & Sensing Heater Jackets & Traps Special Offers Virtual Booth Newport Ophir Spectra-Physics Atotech ESI Solutions Semiconductor Electronics and Packaging Specialty Industrial Support Global Service Technical Support Technical Resources Contact MKS Company About MKS Investor Relations News & Media Careers Contact Contact Us Online Corporate Offices Sales & Application Support Calibration, Service & Repairs Product Technical Support Products Gas Analyzers Mass Spectrometers Vacuum Process and Chamber Environment Monitors Vision 2000-C™ & E™ RGAs for Multi-pressure & CVD/ALD Processes VISION-2000-C CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD Model: VISION-2000-C CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD Model: VISION-2000-C Contact Us Loading... Request a Quote Add to List Add to List Create a New List List Name Required Create a New List Cancel Add to List Your Saved Lists: Preferred List" selected> Add to List Create a New List List Name Required or Create a New List Cancel Add to List 1 item(s) added to VISION-2000-C CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD Continue Shopping View All Saved Lists     Compare Add to List Add to List Create a New List List Name Required Create a New List Cancel Add to List Your Saved Lists: Preferred List" selected> Add to List Create a New List List Name Required or Create a New List Cancel Add to List 1 item(s) added to VISION-2000-C CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD Continue Shopping View All Saved Lists Overview Overview Vision 2000-C™ 1-300 amu Residual Gas Analyzer incorporates "smart head" RGA technology with a closed ion source and close-coupled inlet. This state-of-the-art RGA technology is integrated with Process Eye™ Professional control platform, a recipe-based, user-configurable software program. The combination of closed ion source and automated inlet allows seamless 1 to 300 amu monitoring of the complete CVD or Etch process cycle.

Product Series Overview Vision 2000-C™ & E™ RGAs for Multi-pressure & CVD/ALD Processes Technical Specs Technical Specs Mass Range 1 - 300 amu Ion Source High conductance closed ion source Filaments Twin Tungsten filaments Mass Filter Double filter (1 in. "RF only" pre-filter with 4 in. main filter) Detector Dual (Faraday and secondary electron multiplier) Maximum Analyzer Operating Pressure 1e-3 Torr at the ion source inlet (standard), higher pressure optional Minimum Detectable Concentration Mass Stability Better than ±0.1 amu over 8 hours Resolution Better than 10% valley for peaks of equal height across mass range Base Pressure Range Ion source at maximum pressure at 1, 10 or 100 mTorr Process Pressure Range Ion source at maximum pressure at 10, 100, 500, 1.5, 5, 10, 40, 100 or 700 Torr (*Optional gas acceleration for ranges Mounting Flange DN35CF (70 mm/2.75 in. OD) Conflat. Custom adapters can be provided. Vacuum Hardware 60 l/s turbomolecular pump with high conductance analyzer housing, inlet system, UniBloc™ inlet, automated vacuum control (RVC) completely interlocked and integrated Backing Vacuum System Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting, Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system Analyzer Housing Base Pressure Better than 5e-9 Torr after bakeout Bake Out Temperature 180°C with Bakeout Jacket Operating Temperature 90°C (controlled to ±1°C) Weight 33 lbs. (15 kg) to bolt on Process System Mechanical Support Optional stands and brackets are available Mobile RGA Platform Optional RGA trolley to improve versatility (footprint 18 x 24 in., 455 x 604 mm) Pneumatics 60-80 psig CDA Electronics Weight on Flange 1.7 kg Power Requirements 88 - 264 VAC, 47/63 Hz, 600 W Maximum Operating Conditions Electronics: 10 - 40°C, 80% RH (non condensing) LED Status Indication Interlock status, filament emission, SEM, power and communications I/O Capability 4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control Other Facilities Leak check headset socket, external filament trip socket, instrument reset Software Process Eye Professional fully network compatible control platform generating under 32 bit or 64 bit Microsoft Windows XP, Vista, Server 2008 or Windows 7 Communication Ethernet CAT-5e PC Requirements Intel Pentium IV or AMD Athlon XP 1.2 GHz, 1GB RAM, 120 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications. Simultaneous Multi-Sensor Process Eye Professional client/server configuration offers flexible multi-sensor operation. RGA to Vacuum System Cable Length 33 ft. (10 m) standard RGA and 10 ft. (3 m) with mobile RGA platform. Other lengths available dependent upon process system and customer requirements Shipping Weight 44 lbs (20 kg) may vary depending upon backing pump and instrument rack requirements Type Residual Gas Analyzer Measurement Technique Mass Spectrometry Compliance Compliant to RoHS Directive 2002/95/EC (control unit) Technical Specs Mass Range 1 - 300 amu Ion Source High conductance closed ion source Filaments Twin Tungsten filaments Mass Filter Double filter (1 in. "RF only" pre-filter with 4 in. main filter) Detector Dual (Faraday and secondary electron multiplier) Maximum Analyzer Operating Pressure 1e-3 Torr at the ion source inlet (standard), higher pressure optional Minimum Detectable Concentration Mass Stability Better than ±0.1 amu over 8 hours Resolution Better than 10% valley for peaks of equal height across mass range Base Pressure Range Ion source at maximum pressure at 1, 10 or 100 mTorr Process Pressure Range Ion source at maximum pressure at 10, 100, 500, 1.5, 5, 10, 40, 100 or 700 Torr (*Optional gas acceleration for ranges Mounting Flange DN35CF (70 mm/2.75 in. OD) Conflat. Custom adapters can be provided. Vacuum Hardware 60 l/s turbomolecular pump with high conductance analyzer housing, inlet system, UniBloc™ inlet, automated vacuum control (RVC) completely interlocked and integrated Backing Vacuum System Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting, Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system Analyzer Housing Base Pressure Better than 5e-9 Torr after bakeout Bake Out Temperature 180°C with Bakeout Jacket Operating Temperature 90°C (controlled to ±1°C) Weight 33 lbs. (15 kg) to bolt on Process System Mechanical Support Optional stands and brackets are available Mobile RGA Platform Optional RGA trolley to improve versatility (footprint 18 x 24 in., 455 x 604 mm) Pneumatics 60-80 psig CDA Electronics Weight on Flange 1.7 kg Power Requirements 88 - 264 VAC, 47/63 Hz, 600 W Maximum Operating Conditions Electronics: 10 - 40°C, 80% RH (non condensing) LED Status Indication Interlock status, filament emission, SEM, power and communications I/O Capability 4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control Other Facilities Leak check headset socket, external filament trip socket, instrument reset Software Process Eye Professional fully network compatible control platform generating under 32 bit or 64 bit Microsoft Windows XP, Vista, Server 2008 or Windows 7 Communication Ethernet CAT-5e PC Requirements Intel Pentium IV or AMD Athlon XP 1.2 GHz, 1GB RAM, 120 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications. Simultaneous Multi-Sensor Process Eye Professional client/server configuration offers flexible multi-sensor operation. RGA to Vacuum System Cable Length 33 ft. (10 m) standard RGA and 10 ft. (3 m) with mobile RGA platform. Other lengths available dependent upon process system and customer requirements Shipping Weight 44 lbs (20 kg) may vary depending upon backing pump and instrument rack requirements Type Residual Gas Analyzer Measurement Technique Mass Spectrometry Compliance Compliant to RoHS Directive 2002/95/EC (control unit) CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD PART: VISION-2000-C Contact Us Loading... Request a Quote    Compare Add to List Add to List Create a New List List Name Required Create a New List Cancel Add to List Your Saved Lists: Preferred List" selected> Add to List Create a New List List Name Required or Create a New List Cancel Add to List 1 item(s) added to VISION-2000-C CVD or Etch Process Monitor, 1-300 amu, Multi-pressure & CVD/ALD Continue Shopping View All Saved Lists Overview Technical Specs Need help? Contact an Applications Specialist by sending us an email VISION-2000-C - Drawings & CAD Additional CAD file downloads are not available for this product. CAD File Downloads: Loading... Download Close Close Close VISION-2000-C - Drawings Additional drawings are not available for this product. Close Close VISION-2000-C

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